Advanced masking technology enables new applications for metasurface optics

Optics researchers at Lawrence Livermore National Laboratory (LLNL) have refined their novel metasurface process to create taller features without increasing feature-to-feature spacing, an advance that unlocks exciting new design possibilities. The result is reported in a new paper, “All-Glass Metasurfaces for Ultra-Broadband and Large Acceptance Angle Antireflectivity: from Ultraviolet to Mid-Infrared.” It will be the cover story for the December 2023 issue of Advanced Optical Materials.